Like align-mask, adjust-mask uses a direct or dispersed image to make adjustments to a dewar offset file. However, adjust-mask does this by user interaction, allowing one to make corrections in cases where the image is too complex or confused for the automated process to work.
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USAGE |
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INPUT
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OUTPUT |
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PARAMETERS |
adjust-mask uses the parameter set of mark-slits to control the marking of slit images |
framename.dewoff or newdef.dewoff is created and the
observation definition file is updated with the name of the new dewar offset
file.adjust-mask
is most useful in two situations; when the current dewar offset is so far off
that align-mask is unable to match existing and predicted locations of
features, or when the image is confused, for example when mapping the location
of zero and second order images lying on top of a first order spectrum. Because
it relies on mouse pointing for locations, it is not precise, but the
dewar offset files it produces are adequate for input into align-mask,
and to predict location of unwanted spectrum orders for input to badorders.
In the latter case, where different orders may require different dewar offsets,
one can specify a unique name for each using the -d newdef
input parameter.